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The future of the EUV lithography market looks promising with opportunities in the integrated device manufacturers (IDM) and foundry industries. The global EUV lithography market is expected to grow with a CAGR of 27% to 29% from 2021 to 2026. The major drivers for this market are rising demand for miniaturization of chip size and increasing demand of EUV lithography manufacturing and production.
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The study includes trends and forecast for the global EUV lithography market by light source, equipment, end use industry, and region as follows:
By Light Source [$M shipment analysis for 2015 – 2026]:
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Laser Produced Plasmas (LPP)
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Vacuum Sparks
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Gas Discharges
By Equipment [$M shipment analysis for 2015 – 2026]:
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Light Source
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Mirrors
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Mask
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Otros
By End Use Industry [$M shipment analysis for 2015 – 2026]:
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Integrated device manufacturers (IDM)
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Foundry
By Region [$M shipment analysis for 2015 – 2026]:
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América del norte
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Estados Unidos
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Canadá
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México
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Europa
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Alemania
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Reino Unido
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Francia
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Italia
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Asia Pacífico
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Porcelana
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Japón
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India
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Corea del Sur
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The Rest of the World
Laser produced plasma (LPP) will remain the largest segment due to growth in the IDM end use industry.
IDM will remain the largest end use industry during the forecast period due to rising demand in various consumer applications, majorly in smartphones.
Asia Pacific will remain the largest region during the forecast period due to increasing demand from Fab-less players at leading foundries and growing number of wafer processing capability in APAC region.
Some of the EUV lithography companies profiled in this report include ASML Holding, Nikon Corporation, Canon Inc., Carl Zeiss, Toppan Printing, NTT Advanced Technology, Intel, Samsung, SK Hynix, Toshiba, TSMC, and GLOBALFOUNDRIES.
Features of EUV Lithography Market
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Market Size Estimates: EUV Lithography market size estimation in terms of value ($M)
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Trend and Forecast Analysis: Market trends (2015-2020) and forecast (2021-2026) by various segments and regions.
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Segmentation Analysis: Market size by light source, equipment, and end use industry
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Regional Analysis: EUV Lithography market breakdown by North America, Europe, Asia Pacific, and the Rest of the World.
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Growth Opportunities: Analysis on growth opportunities in different end use industries, light source, equipment, and regions for EUV lithography market.
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Strategic Analysis: This includes M&A, new product development, and competitive landscape for the EUV lithography market.
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Analysis of competitive intensity of the industry based on Porter’s Five Forces model.
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Este informe responde después de 11 preguntas clave |
Q.1 What are some of the most promising potential, high-growth opportunities for the global EUV lithography market by light source (laser produced plasma (LPP), vacuum sparks, and gas discharges), equipment (light source, mirror, mask, and others), end use industry (integrated device manufacturers (IDM) and foundry), and region (North America, Europe, Asia Pacific, and the Rest of the World)?
Q.2 Which segments will grow at a faster pace and why?
Q.3 Which regions will grow at a faster pace and why?
Q.4 What are the key factors affecting market dynamics? What are the drivers and challenges of the EUV lithography market?
Q.5 What are the business risks and threats to the EUV lithography market?
Q.6 What are emerging trends in the EUV lithography market and the reasons behind them?
Q.7 What are some changing demands of customers in the EUV lithography market?
Q.8 What are the new developments in the EUV lithography market? Which companies are leading these developments?
Q.9 Who are the major players in the EUV lithography market? What strategic initiatives are being implemented by key players for business growth?
Q.10 What are some of the competitive products and processes in the EUV lithography market, and how big of a threat do they pose for loss of market share via material or product substitution?
Q.11 What M&A activities did take place in the last five years in the EUV lithography market? |